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新闻中心 Semiconductor IC Manufacturing> High purity C4F6 with the purity 4N Introduction

High purity C4F6 with the purity 4N Introduction

2019-12-25 14:04

Yuji Tech is one of the manufacturers of fluorine-containing chemicals, which has the production and purification technology of Hexafluoro-1,3-butadiene (C4F6), whose purity can arrive Grade 4N(99.99%).

Hexafluoro-1,3-butadiene (C4F6), also known as HFBD and HFO-2316, is a colorless, odorless, flammable liquefied gas. As an environmentally friendly fluorine chemicals with low GWP, C4F6 has become one of the most advanced dry etching gases with a low C/F ratio and unsaturated bonds. C4F6 shows many application advantages in plasma, ion beam or sputter dry etching in semiconductor devices manufacturing.

The physical properties, package and shipping information for C4F6 are as follows.

Physical Data

Molecular Weight 162
Boiling Point (℃) 6
Vapor Pressure (bar, @0 ℃) 19.65
Critical Temperature (℃) 136.75
Critical Pressure (kPa) 3131
Liquid Density (g/ml) 1.553
GWP (100years) <1
ODP 0

Applications

Used as a dry etching gas in silicon-based integrated circuits

 

Application advantages:

Higher aspect ratio

Low C/F ratio and insaturations lead to narrow and deep grooves for processing at very narrow line widths (as narrow as 45-25nm)

Higher selectivity

Compared with octafluorocyclobutane (c-C4F8), C4F6 is sensitive to silicon dioxide over photoresist, silicon substrate or nitride film. Only the dielectric substrate can be etched.

Low GWP

The global warming potential of C4F6 is less than 1, and has a much shorter lifetime in the atmosphere.