Introduction
Methyl Fluoride (CH3F) , also known as Fluoromethane, Freon 41, Halocarbon-41 and HFC-41, is a non-toxic, liquefied and flammable gas at standard temperature and pressure. It is an environmentally friendly dry etching gas with low GWP, which shows very high performance in plasma etching of silicon compound films in semiconductor manufacturing. Etching of the Si3N4 spacer can be achieved in CH3F-O2-He mixtures, which offer a high selectivity towards silicon. CH3F/C4F8 Ratio will have effect on the Oxide-to-Nitride Selectivity in a Self-Aligned-Contact etching process. CH3F is also expected to outpace capacity as 3D NAND flash start-ups.
Applicant and Patent
APPLICANT | PATENT NAME |
United microelectronics corp.(TW) | Semiconductor device having spacer with tapered profile |
APPLIED MATERIALS INC [US] | Dielectric etch method with high source and low bombardment plasma providing high etch rates |
UNITED MICROELECTRONICS CORP | Semiconductor device and method for fabricating the same |
TOKYO ELECTRON LTD | Exhaust gas explosion prevention method for reduced pressure processing device |
HITACHI HIGH TECH CORP | Dry etching method |
LAM RES CORP | Line edge roughness control |
PROMOS TECHNOLOGIES INC | Method of etching capable of avoiding loading effect and controlling the thickness of screen oxide |
CENTRAL GLASS CO LTD [JP] | Etching Gas |
TOKYO ELECTRON LTD | PLASMA TREATMENT METHOD AND PLASMA TREATMENT DEVICE |
FUJITSU SEMICONDUCTOR LTD [JP] | Method of etching silicon nitride by a mixture of CH2F2, CH3F or CHF3 and an inert gas |
CENTRAL GLASS CO LTD [JP] | Cleaning Gas |
SEMICONDUCTOR MFG INT SHANGHAI | Semiconductor device used in interconnection technology and manufacturing method thereof |
ADVANCED TECH MATERIALS [US] | Cleaning of semiconductor processing systems |
TAIWAN SEMICONDUCTOR MFG | Method for forming a tapered profile insulator shape |
SAMSUNG ELECTRONICS CO LTD | Composition for a wiring, a wiring using the composition, a manufacturing method thereof, a display using the wiring and a manufacturing method thereof |